pp. 1995-2011
S&M3303 Research Paper of Special Issue https://doi.org/10.18494/SAM4351 Published: June 27, 2023 UV-curable Polydimethylsiloxane Photolithography and Its Application to Flexible Mechanical Metamaterials [PDF] Ten Sekiguchi, Hidetaka Ueno, Vivek Anand Menon, Ryo Ichige, Yuya Tanaka, Hiroshi Toshiyoshi, and Takaaki Suzuki (Received February 13, 2023; Accepted June 19, 2023) Keywords: UV-PDMS, photolithography, polydimethylsiloxane, mechanical metamaterial, backside exposure
Polymers are increasingly being used as flexible structural materials in MEMS. We have focused on UV-cured polydimethylsiloxane (UV-PDMS), which is both photoreactive and highly flexible. In this study, we propose a photolithography-based patterning method to enable the microfabrication of UV-PDMS. The processing conditions related to patterning accuracy were also investigated. Furthermore, as a demonstration of the practical advantages of this processing method, free-standing flexible metamaterials with a negative Poisson’s ratio were fabricated and uniaxial tensile tests were performed. The results showed a minimum Poisson’s ratio of -1.30. Compared with the same type of specimen fabricated with a common permanent structural photoresist, the UV-PDMS specimen exhibited deformation approximately 12 times larger.
Corresponding author: Takaaki SuzukiThis work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Ten Sekiguchi, Hidetaka Ueno, Vivek Anand Menon, Ryo Ichige, Yuya Tanaka, Hiroshi Toshiyoshi, and Takaaki Suzuki, UV-curable Polydimethylsiloxane Photolithography and Its Application to Flexible Mechanical Metamaterials, Sens. Mater., Vol. 35, No. 6, 2023, p. 1995-2011. |