pp. 213-218
S&M325 Research Paper of Special Issue Published: 1998 Wet Etching of InGaP and GaAs in HCl: H3PO4: H2O2 [PDF] Jaroslava Škriniarová, Jaroslav Kováč, Juraj Breza and Dagmar Gregušová Cite this article Jaroslava Škriniarová, Jaroslav Kováč, Juraj Breza and Dagmar Gregušová, Wet Etching of InGaP and GaAs in HCl: H3PO4: H2O2, Sens. Mater., Vol. 10, No. 4, 1998, p. 213-218. |